posted by: vgoss
I used PMMA, polymethyl methacrylate , , which is a resin (resist). First, I spin-coated a thin film of PMMA on clean silicon. Next, the electron beam is focused onto the surface, and with nanoscale precision the beam interacts with the resist to interrupt the polymer bonds at specific locations on the sample forming patterns. After removing the sample from the instrument, and back in the lab, I bathed the sample in a developer solution. This solution completly disrupts the PMMA bonds and the pattern can be imaged!
Click here, If you want to learn about PMMA. This is a friendly website with general information that I found very interesting!